Keynotes

Keynote Lectures
Bescond	Marc	L2MP/CNRS, France
"Quantum Transport Modeling of Nanoscale MOSFETs"
Bourgoin	Jean-Philippe	CEA Saclay, France
"Self-assembling carbon nanotube devices"
Brugger	Juergen	EPFL, Switzerland
"High throughput direct surface patterning by shadow deposition through DUV/MEMS nanostencils"
Garcia	Ricardo	IMM/CSIC, Spain
"Bridging nano and macro worlds with water meniscii: Attomol chemistry and Nanofabrication by Local oxidation Nanolithography"
Henry	Daniel	ST Microelectronics, France
"Is EUV Lithography destined to be always for the "next generation"?"
Jehl	Xavier	CEA/DRFMC, France
"The MOS single Electron transistor (MOS-SET)"
Joachim	Christian	CEMES/CNRS, France
"Resources and technology to compute with or within a single molecule"
Klimov	Victor I.	Los Alamos National Laboratory, USA
"Nanocrystal quantum dots: from fundamental photophysics to light-emitting diodes and multicolor lasers"
Matsui	Shinji	University of Hyogo (Japan)
"Three-Dimensional Nanotechnology by Focused-Ion-Beam Chemical-Vapor-Deposition"
Nassiopoulou	Androula	IMEL/NCSR Demokritos, Greece
"Semiconductor nanocrystalsin ultra thin SiO2 layers for non-volatile memory applications"
Pum	Dietmar	Center for Nanobiotechnology, Austria
"S-layer based nanostructures"
Saenz	Juan Jose	UAM, Spain
Sotomayor Torres	Clivia	NMRC, Ireland
"Nanoimprint lithography for organic nanoelectronics and polymer photonics"
Van Hove	Patrick	European Commission (IST/FET), Belgium
"Advanced research in Nanotechnology Information Devices and Nanoelectronics: contribution of EC programmes in IST"
Vieu	Christophe	LAAS/CNRS, France
"Nano-addressing biomolecules for high sensitivity biodetection"
Welland	Mark	Cambridge University/IRC, UK
"Challenges in Nanofabrication - High Resolution E-beam Lithography and Directed Self-Assembly"

Keynote Lectures / Industrial Day
Despont	Michel	IBM, Switzerland
"Thousands of Micro-Cantilevers for highly parallel and ultra-dense Probe Data Storage"
Graef	Mart	Philips Semiconductors, The Netherlands
"How much lithography can the semiconductor industry afford?"
Kretz	Johannes	Infineon Technologies, Germany
"Electron Beam lithography for the fabrication of nano-scale FinFET device demonstrators"
Legagneux	Pierre	THALES, France
"Nanowires and nanotubes for field emission displays, parallel e-beam lithography and microwave amplifiers"
Rivoal	Herve	ATMEL
"Lithography Performances of 248nm and 193nm Scanners in Production Mode"
Takahashi	Yasuo	NTT Basic Research Labs, Japan
"Fabrication and application of silicon single-electron devices"
Wahlbrink	Thorsten	Amo GmbH, Germany
"Electron beam lithography for applications in Nanotechnology"