Nanoimprint Lithography
Coordinator: Clivia Sotomayor Torres (NMRC, Ireland) |
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Soft Lithography and Self-Assembly
Coordinator: Bruno Michel (IBM, Switzerland) |
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MEMS-based Nanopatterning (this includes nano-stencil and dip-pen)
Coordinator: Juergen Brugger (EPFL, Switzerland) |
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Materials
Coordinator: Gabi Grützner (Micro Resist Technology GmbH, Germany) |
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Tools
Coordinator: Jörg Kühnholz (SUSS, Germany) |
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Simulation
Coordinator: Jim Greer (NMRC, Ireland) |
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Training and Dissemination
Coordinator: Christophe Vieu (LAAS/CNRS, France) |
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