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LITHO2006 full contributions available for download (pdf format) - More info

Since early seventies, microelectronic industry has been the motor of advanced research in the field of microfabrication and  nanofabrication in order to shrink down the dimensions of the components to increase the integration rate of ICs. Today’s optical lithography allows to reach feature size as small as 100 nm, and it is now expected in the ITRS (International Technology Roadmap for Semiconductors) that the node 50 nm will be reached in 2009. It is thought that optical lithography can be pushed down to roughly 30 nm. However, for further integration, New Generation Lithography (NGL) principles and tools must be designed. From the point of view of components, alternative elementary device must be imagined to replace FET, to scale down below 15 nm.

Besides electronics, Micro and Nano miniaturisation advances (breakthroughs) have now found applications in the field of life science, and scientists from biology, chemical, physical and medical communities propose currently new devices for function recognition (nano biochip), or to ensure artificially a function in human body (micro-capillaries and micro-valves…) or to reproduce artificially in-vivo environments (biomimetics surfaces).
The general purpose of this workshop is to gather researchers interested in the design and fabrication of nano-devices and micro-devices for electronics and life science. The association of researchers working in theory, design/modelling, on miniaturisation (top-down, bottom-up and coupling of both processes) and biology will be an opportunity for fruitful discussions.

A full day will be devoted to speakers from private companies, IC producers or equipment suppliers.

Conference topics: