The Emerging Nanopatterning Methods (NaPa) consortium integrates the best of existing European know-how in nanolithography, including the leading institutes and companies active in the field of nanopatterning into a single Integrated Project.
The approach taken by the NaPa consortium complements optical lithography by providing cost-efficient processes and tools to cover the needs of nanopatterning from CMOS back-end processes through photonics to biotechnology. To achieve this, research in three technology strands will be pursued: nanoimprint lithography, soft lithography & self-assembly and MEMS-based nanopatterning. While the first is at a crucial embryonic stage, requiring prompt consolidation to yield its first products in the near future, the latter two are of longer term in nature.
Thus, thematically, the consortium embraces and pushes forward the state-of-the-art developments in the physical and engineering sciences with the object-driven mission to provide European industrial and academic researchers with the know-how to underpin innovations and further scientific developments in nanotechnology.
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