The subproject MEMS based Nanopatterning deals with two different approaches, both based on microfabricated tools, to create micro- and nanostructures: Stencil and Scanning probe lithography.
More info about Stencil Lithography available downloading the EPFL poster presented at the Berlin NaPa Plenary Meeting.
More info about MEMS available downloading the CNM/CSIC and Tyndall posters presented at the Berlin NaPa Plenary Meeting.
| The stencil method (shadow evaporation) is based on selective deposition of material through shadow masks (micro- and nanostencils). The main added value is that the technique does not rely on photoresist processes. The stencil method typically uses solid-state membranes with structures in the nanometer range (< 100 nm) in combination with micrometer features (>10 µm). These structures can be transferred to a substrate in a single process step, potentially in a non-contact mode. The deposited structures can either be used directly, transferred into a sub-layer, combined by lift-off processes, or refined by self assembly or other growth processes. |
| An optical image of a full wafer scale (100 mm) stencil (EPFL) containing various membranes, each containing numerous geometrical apertures |
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Scanning probe lithography (nanodispensing) is based on deposition of liquids through apertured scanning force microscopy probe tips. The advantage of nanodispensing is its versatility. By varying the nature of the liquid various applications can be envisaged, such as the production of bio-arrays by using protein solutions and rapid prototyping by using etch resistant liquids or SAM materials. This approach further benefits from the proven possibility to address more than 1000 cantilevers in parallel. Since the setup is a fully functional force microscope, identifying and linking to previously written structures is straightforward.
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Array of 4 cantilevers with passivated aluminum electrodes for electrowetting (LAAS) and the deposition of two different solutions with these cantilevers (down to 10 m m).
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We will concentrate on unconventional combinations on the material/substrate side, which cannot be realized by conventional lithography or the other emerging nanopatterning methods. In addition, we will demonstrate the patterning of nanostructures on pre-patterned CMOS-chips and MEMS.
The subproject MEMS deals with the development of new micro-mechanical tools for the patterning of surfaces either by local liquid dispensing through nanoprobes (NADIS, BioPlume), or by local material deposition through miniature shadow-mask (nanostencil). The patterning techniques have several distinct advantages with respect to conventional, photolithography methods: they are scalable, use simple equipment, are purely additive, and reduce cross-contamination. The use of micromechanical, fast and compliant devices allow for high-speed, parallel patterning using a ‘mechanical zoom’ from micro to nanometer scale. Application to soft and/or fragile surfaces make MEMS based nanopatterning versatile and useful for application in bio/nanotechnology, surface materials science, solid-state physics, nanoelectronics/molecular electronics, spintronics. MEMS-based pattering are excellent for rapid prototyping, but are scalable to full wafer scale.
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